CVD copper thin film deposition using (α-methylstyrene)Cu(I)(hfac) W. Zhuang, L.J. Charneski, D.R. Evans, S.T. Hsu, Z. Tang et A.M. Guloy J. Phys. IV France, 11 PR3 (2001) Pr3-553-Pr3-560 DOI: 10.1051/jp4:2001370