Journal de Physique IV

Direct liquid injection MOCVD growth of TiO₂ films using the precursor Ti(mpd)(dmae)₂

A. Awaluddin, M.E. Pemble, A.C. Jones and P.A. Williams

J. Phys. IV France, 11 PR3 (2001) Pr3-531-Pr3-537

DOI: 10.1051/jp4:2001367

A. Awaluddin

M.E. Pemble

A.C. Jones

P.A. Williams

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