Journal de Physique IV

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Fundamental studies on the decomposition mechanism of Ti(OC₃H₇)₄ and TiO₂ film evolution on Si(100) and Pt(100) surfaces

S.-I. Cho, S.H. Moon and C.-H. Chung

J. Phys. IV France, 11 PR3 (2001) Pr3-517-Pr3-524

DOI: 10.1051/jp4:2001365

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