Journal de Physique IV

Study of SiO₂-films deposited by adding N₂O or O₂ to TEOS in photo-chemical vapor deposition at room temperature

Y. Motoyama, J.-I. Miyano, K. Toshikawa, Y. Yagi, H. Yanagida, K. Kurosawa and A. Yokotani

J. Phys. IV France, 11 PR3 (2001) Pr3-1131-Pr3-1137

DOI: 10.1051/jp4:20013142

Y. Motoyama

J.-I. Miyano

K. Toshikawa

Y. Yagi

H. Yanagida

K. Kurosawa

A. Yokotani

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