Journal de Physique IV

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Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition

C. Shim, J. Yang, Y. C. Quan, J. Choi and D. Jung

J. Phys. IV France, 11 PR3 (2001) Pr3-795-Pr3-802

DOI: 10.1051/jp4:20013100

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