Journal de Physique IV

The role of atomic surface structure in the metalorganic chemical vapor deposition of III-V compound semiconductors

R.F. Hicks, Q. Fu, L. Li, S.B. Visbeck, Y. Sun, C.H. Li and D.C. Law

J. Phys. IV France, 11 PR3 (2001) Pr3-31-Pr3-37

DOI: 10.1051/jp4:2001304

R.F. Hicks

Q. Fu

L. Li

S.B. Visbeck

Y. Sun

C.H. Li

D.C. Law

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