Journal de Physique IV

Modeling of SiO₂ deposition from mixtures of tetraethoxysilane and ozone in an APCVD industrial reactor

J.-P. Nieto, B. Caussat, J.-P. Couderc, S. Coletti and L. Jeannerot

J. Phys. IV France, 09 PR8 (1999) Pr8-149-Pr8-155

DOI: 10.1051/jp4:1999818

J.-P. Nieto

B. Caussat

J.-P. Couderc

S. Coletti

L. Jeannerot

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)