Application of Raman spectrometry for the characterization of complex oxide thin films grown by MOCVD B. Güttler, O.Yu. Gorbenko, M.A. Novozhilov, S.V. Samoilenkov, V.A. Amelichev, G. Wahl et H.W. Zandbergen J. Phys. IV France, 09 PR8 (1999) Pr8-1179-Pr8-1186 DOI: 10.1051/jp4:19998147