Journal de Physique IV

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Comparison of tantalum precursors for use in liquid injection CVD of thin film oxides, dielectrics and ferroelectrics

M.J. Crosbie, P.J. Wright, D.J. Williams, P.A. Lane, J. Jones, A.C. Jones, T.J. Leedham, P. O'Brien and H.O. Davies

J. Phys. IV France, 09 PR8 (1999) Pr8-935-Pr8-942

DOI: 10.1051/jp4:19998118

M.J. Crosbie

P.J. Wright

D.J. Williams

P.A. Lane

J. Jones

A.C. Jones

T.J. Leedham

P. O'Brien

H.O. Davies

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Copyright / Publiée par : EDP Sciences