Journal de Physique IV

RMPECVD of silica films in large scale microwave plasma reactor : Films properties

F. Naudin, P. Tristant, M.C. Hugon, I. Jauberteau, B. Agius and J. Desmaison

J. Phys. IV France, 09 PR8 (1999) Pr8-819-Pr8-826

DOI: 10.1051/jp4:19998104

F. Naudin

P. Tristant

M.C. Hugon

I. Jauberteau

B. Agius

J. Desmaison

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