Journal de Physique IV

The effect of reactively-sputtered alumina films on the oxidation resistance of CoCrAlY coatings

Fuhui Wang, Shenglong Zhu, Hanyi Lou and Weitao Wu

J. Phys. IV France, 03 C9 (1993) C9-551-C9-557

DOI: 10.1051/jp4:1993958

Fuhui Wang

Shenglong Zhu

Hanyi Lou

Weitao Wu

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