Journal de Physique IV

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LPCVD of SiC layers in a hot-wall reactor using TMS precursor

F. HENRY, P. MARTI, Y. CASAUX, C. COMBESCURE, A. FIGUERAS, V. MADIGOU, R. RODRIGUEZ-CLEMENTE, A. MAZEL, J. SEVELY and B. ARMAS

J. Phys. IV France, 03 C3 (1993) C3-329-C3-336

DOI: 10.1051/jp4:1993345

F. HENRY

P. MARTI

Y. CASAUX

C. COMBESCURE

A. FIGUERAS

V. MADIGOU

R. RODRIGUEZ-CLEMENTE

A. MAZEL

J. SEVELY

B. ARMAS

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Copyright / Publiée par : EDP Sciences