Journal de Physique IV

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UHV CHEMICAL VAPOUR DEPOSITION OF UNDOPED AND IN-SITU DOPED POLYSILICON FILMS

W. AHMED, R.D. PILKINGTON and D.B. MEAKIN

J. Phys. IV France, 02 C2 (1991) C2-809-C2-816

DOI: 10.1051/jp4:1991295

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