Journal de Physique IV

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INFLUENCE OF ETCHING THE TiC UNDERLAYER WITH CH₄/AlCl₃/H₂ ON THE CVD FORMATION OF KAPPA-Al₂O₃

M. DANZINGER, R. HAUBNER and B. LUX

J. Phys. IV France, 02 C2 (1991) C2-579-C2-586

DOI: 10.1051/jp4:1991269

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