Journal de Physique IV

DOWNSTREAM MICROWAVE PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION OF SiO₂ USING O₂/SiH₄ AND N₂O/SiH₄ MIXTURES

H. DEL PUPPO, T. SINDZINGRE, L. PECCOUD and J. DESMAISON

J. Phys. IV France, 02 C2 (1991) C2-421-C2-428

DOI: 10.1051/jp4:1991251

H. DEL PUPPO

T. SINDZINGRE

L. PECCOUD

J. DESMAISON

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