Journal de Physique IV

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KINETIC APPROACH OF THE DEPOSITION OF SILICON CARBIDE BASED FILMS OBTAINED BY PACVD

W. ZHANG, M. LELOGEAIS and M. DUCARROIR

J. Phys. IV France, 02 C2 (1991) C2-381-C2-388

DOI: 10.1051/jp4:1991246

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