Journal de Physique IV

SILICON DEPOSITION FROM DISILANE : EXPERIMENTAL STUDY AND MODELLING

M. GUEYE, E. SCHEID, P. TAURINES, P. DUVERNEUIL, D. BIELLE-DASPET and J.P. COUDERC

J. Phys. IV France, 02 C2 (1991) C2-63-C2-70

DOI: 10.1051/jp4:1991207

M. GUEYE

E. SCHEID

P. TAURINES

P. DUVERNEUIL

D. BIELLE-DASPET

J.P. COUDERC

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