Principles for Controlling the Electronic Quality of High-Rate Deposited a-Si:H Films G. Suchaneck, T. Blum, S. Röhlecke et A. KottwitzJ. Phys. IV France, 05 C5 (1995) C5-655-C5-661DOI: https://doi.org/10.1051/jphyscol:1995578
