Optical Emission Analysis of a Si(CH3)4-Argon Radio Frequency Plasma for SiC Films Deposition M. Andrieux, J. M. Badie, C. Bisch, M. Ducarroir et F. TeyssandierJ. Phys. IV France, 05 C5 (1995) C5-607-C5-614DOI: https://doi.org/10.1051/jphyscol:1995572
