Nickel Thin Films Grown by MOCVD Using Ni(dmg)2 as Precursor M. Becht, J. Gallus, M. Hunziker, F. Atamny et K.-H. DahmenJ. Phys. IV France, 05 C5 (1995) C5-465-C5-472DOI: https://doi.org/10.1051/jphyscol:1995553
