Reactor Modelling and Analysis of Amorphous Hydrogenated Silicon Deposition by PECVD A. Djelloul, B. Despax, J. P. Couderc et P. DuverneuilJ. Phys. IV France, 05 C5 (1995) C5-307-C5-314DOI: https://doi.org/10.1051/jphyscol:1995536
