Kinetics of Chemical Vapour Deposition of Boron Nitride from a Gas Mixture of Trimethylborazine, Ammonia, and Hydrogen at 900 to 1050 °C and 1 Bar Total Pressure
J. Phys. IV France, 05 C5 (1995) C5-167-C5-174
DOI: https://doi.org/10.1051/jphyscol:1995518