Investigation of the Substrate/Epitaxial Interface of Si/Si1-xGex Layers Grown by LPCVD R. Loo, L. Vescan, C. Dieker, D. Freundt, A. Hartmann et A. MückJ. Phys. IV France, 05 C5 (1995) C5-895-C5-903DOI: https://doi.org/10.1051/jphyscol:19955106
