Kinetic Processes in the CVD of SiC from CH3SiCl3-H2 in a Vertical Hot-Wall Reactor F. Langlais, F. Loumagne, D. Lespiaux, S. Schamm et R. NaslainJ. Phys. IV France, 05 C5 (1995) C5-105-C5-112DOI: https://doi.org/10.1051/jphyscol:1995510
