Monitoring of SiC Deposition in an Industrial CVI/CVD Reactor by In-Situ FTIR Spectroscopy H. Mosebach, V. Hopfe, M. Erhard et M. MeyerJ. Phys. IV France, 05 C5 (1995) C5-97-C5-104DOI: https://doi.org/10.1051/jphyscol:1995509
