Thermochemical and Mass Transport Modelling of the Chemical Vapour Deposition of Si1-xGex M. Pons, E. Blanquet, C. Bernard, H. Rouch, J. M. Dedulle et R. MadarJ. Phys. IV France, 05 C5 (1995) C5-63-C5-70DOI: https://doi.org/10.1051/jphyscol:1995504
