Kinetics of the drying process of an anti-adherent coating using Photothermal Radiometry and Micro-Raman D.M. Hurtado-Castañeda, J. Fernández, R. Velázquez, M. Estévez, S. Vargas, R. Rodríguez et M.E. RodríguezJ. Phys. IV France, 125 (2005) 593-596DOI: https://doi.org/10.1051/jp4:2005125136
