Characterization of amorphous SIC:H thin films grown by RF plasma enhanced CVD on annealing temperature M.G. Park, W.S. Choi, J.-H. Boo, Y.T. Kim, D.H. Yoon et B. HongJ. Phys. IV France, 12 4 (2002) 155-160DOI: https://doi.org/10.1051/jp4:20020090
