Simulation and validation of SiO2 LPCVD from TEOS in a vertical 300 mm multi-wafer reactor G.J. Schoof, C.R. Kleijn, H.E.A. Van Den Akker, T.G.M. Oosterlaken, H.J.C.M. Terhorst et F. HuussenJ. Phys. IV France, 12 4 (2002) 51-61DOI: https://doi.org/10.1051/jp4:20020077
