Microwave plasma enhanced CVD of aluminum oxide films: Influence of the deposition parameter on the films characteristics H. Hidalgo, P. Tristant, A. Denoirjean et J. DesmaisonJ. Phys. IV France, 11 PR3 (2001) Pr3-723-Pr3-730DOI: https://doi.org/10.1051/jp4:2001391
