Electron-impact silane dissociation and deposition rate relationship in the PECVD of microcrystalline silicon thin films E. Amanatides, D. E. Rapakoulias et D. MatarasJ. Phys. IV France, 11 PR3 (2001) Pr3-715-Pr3-722DOI: https://doi.org/10.1051/jp4:2001390
