Direct liquid injection MOCVD growth of TiO2 films using the precursor Ti(mpd)(dmae)2 A. Awaluddin, M. E. Pemble, A. C. Jones et P. A. WilliamsJ. Phys. IV France, 11 PR3 (2001) Pr3-531-Pr3-537DOI: https://doi.org/10.1051/jp4:2001367
