Structural and morphological changes in low temperature annealed LPCVD Si layers B. Cobianu, M. Modreanu, M. Danila, R. Gavrila, M. Bercu et M. GartnerJ. Phys. IV France, 11 PR3 (2001) Pr3-315-Pr3-323DOI: https://doi.org/10.1051/jp4:2001340