Kinetics of the initial stages of film formation during low pressure chemical vapour deposition of polysilicon by pyrolysis of silane L. Zambov, B. Caussat, R. Boubeker et J.-P. CoudercJ. Phys. IV France, 11 PR3 (2001) Pr3-189-Pr3-196DOI: https://doi.org/10.1051/jp4:2001324
