Fabrication of fine copper lines on AZ 5214TM patterned silicon substrates by selective chemical vapor deposition A. N. Gleizes, S. Vidal et D. DavazoglouJ. Phys. IV France, 11 PR3 (2001) Pr3-1197-Pr3-1201DOI: https://doi.org/10.1051/jp4:20013151
