Comparative study of atomic layer deposition and low-pressure MOCVD of copper sulfide thin films B. Meester, L. Reijnen, A. Goossens et J. SchoonmanJ. Phys. IV France, 11 PR3 (2001) Pr3-1147-Pr3-1152DOI: https://doi.org/10.1051/jp4:20013144