Study of SiO2-films deposited by adding N2O or O2 to TEOS in photo-chemical vapor deposition at room temperature Y. Motoyama, J.-I. Miyano, K. Toshikawa, Y. Yagi, H. Yanagida, K. Kurosawa et A. YokotaniJ. Phys. IV France, 11 PR3 (2001) Pr3-1131-Pr3-1137DOI: https://doi.org/10.1051/jp4:20013142
