Characterization of low-dielectric constant SiOCN films synthesized by low pressure chemical vapour deposition L. M. Zambov, B. Ivanov, C. Popov, G. Georgiev, I. Stoyanov et D. B. DimitrovJ. Phys. IV France, 11 PR3 (2001) Pr3-1005-Pr3-1012DOI: https://doi.org/10.1051/jp4:20013126
