The role of atomic surface structure in the metalorganic chemical vapor deposition of III-V compound semiconductors R. F. Hicks, Q. Fu, L. Li, S. B. Visbeck, Y. Sun, C. H. Li et D. C. LawJ. Phys. IV France, 11 PR3 (2001) Pr3-31-Pr3-37DOI: https://doi.org/10.1051/jp4:2001304
