Photo-CVD deposited TiO2 films studied by Raman and XPS spectroscopy J. Y. Zhang, Q. Fang, J. X. Wu, C. Y. Xu, B. J. O'Sullivan, P. K. Hurley, T. L. Leedham, M.A. Audier, J. P. Sénateur et I. W. BoydJ. Phys. IV France, 11 PR11 (2001) Pr11-295-Pr11-299DOI: https://doi.org/10.1051/jp4:20011148
