Chloride atomic-layer chemical vapor deposition of TiO2 with a chloride pretreatment of substrates A. Niilisk, A. Rosental, T. Uustare, A. Kasikov et A. TarreJ. Phys. IV France, 11 PR11 (2001) Pr11-103-Pr11-107DOI: https://doi.org/10.1051/jp4:20011116
