Raman scattering investigation of the structure of amorphous silicon in a-Si/SiO2 superlattice films Y. Wang, O. Matsuda, T. Serikawa et K. MuraseJ. Phys. IV France, 10 PR7 (2000) Pr7-259-Pr7-262DOI: https://doi.org/10.1051/jp4:2000752
