Gas-phase FT-IR analysis and growth kinetics of Al2O3 in a LP-MOCVD reactor using new dialkylacetylacetonate precursors G. A. Battiston, G. Carta, R. Gerbasi, M. Porchia, L. Rizzo et G. RossettoJ. Phys. IV France, 09 PR8 (1999) Pr8-675-Pr8-681DOI: https://doi.org/10.1051/jp4:1999885