Deposition and characterization of CVD – MoO3 thin films K. A. Gesheva, T. Ivanova, A. Iossifova, D. Gogova et R. PoratJ. Phys. IV France, 09 PR8 (1999) Pr8-453-Pr8-459DOI: https://doi.org/10.1051/jp4:1999857
