LPCVD vertical furnace optimization for undoped polysilicon film deposition A. M. Rinaldi, S. Carrà, M. Rampoldi, M. C. Martignoni et M. MasiJ. Phys. IV France, 09 PR8 (1999) Pr8-189-Pr8-196DOI: https://doi.org/10.1051/jp4:1999823
