Chemical vapor deposition of semi-insulating polycrystalline silicon (SIPOS) : Experience and simulation P. Barathieu, B. Caussat, E. Scheid, D. Jaume et J. P. CoudercJ. Phys. IV France, 09 PR8 (1999) Pr8-173-Pr8-180DOI: https://doi.org/10.1051/jp4:1999821
