Modeling of SiO2 deposition from mixtures of tetraethoxysilane and ozone in an APCVD industrial reactor J.-P. Nieto, B. Caussat, J.-P. Couderc, S. Coletti et L. JeannerotJ. Phys. IV France, 09 PR8 (1999) Pr8-149-Pr8-155DOI: https://doi.org/10.1051/jp4:1999818
