Some recent developments in chemical vapor deposition process and equipment modeling C. R. Kleijn, K. J. Kuijlaars, M. Okkerse, H. van Santen et H. E.A. van den AkkerJ. Phys. IV France, 09 PR8 (1999) Pr8-117-Pr8-132DOI: https://doi.org/10.1051/jp4:1999815
