Phase and surface roughness evolution for as-deposited LPCVD silicon films C. Cobianu, R. Plugaru, N. Nastase, S. Nastase, C. Flueraru, M. Modreanu, J. Adamczevska, W. Paszkowicz, J. Auleytner et P. CosminJ. Phys. IV France, 09 PR8 (1999) Pr8-1083-Pr8-1090DOI: https://doi.org/10.1051/jp4:19998135
