Deposition kinetics of Al2O3 from AlCl3-CO2-H2-HCl gas mixtures by thermal CVD in a hot-wall reactor M. Schierling, E. Zimmermann et D. NeuschützJ. Phys. IV France, 09 PR8 (1999) Pr8-85-Pr8-91DOI: https://doi.org/10.1051/jp4:1999811
